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The 草榴社区 Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.
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If you missed attending the event live, register below to watch the presentations on-demand.
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Keynote: The Brave New World of Multi-Node Mask Making
Chris Progler, Chief Technology Officer, Photronics Inc
EUV Lithography Patterning: ?Status and Challenges Towards
High NA
Danilo DeSimone, Principal Member of Technical Staff, IMEC
Curvilinear Mask 草榴社区 for ?EUV Lithography Enablement
Thuc Dam?, Sr. Product Engineering Mgr., 草榴社区
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Please visit our sessions and posters page to learn more about 草榴社区 at SPIE Advanced Lithography + Patterning 2023