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Join us for an in-person 草榴社区 Technical Forum, taking place during 2025 SPIE Advanced Lithography + Patterning. Attendees will learn about the latest industry trends along with 草榴社区 Manufacturing's mask synthesis, mask data prep, and lithography simulation solutions.
Why Attend?
草榴社区 provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. 草榴社区’ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.
Who Should Attend?
The 草榴社区 Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.
Agenda
12:00 - 12:30 PM
Registration & Lunch
12:30 - 12:45 PM
Welcome Address by 草榴社区
12:45 - 2:45 PM
Presentations from Industry Leaders
2:45 - 3:15 PM
Technology Update by 草榴社区
3:15 - 3:59 PM
Thank You & Prize Drawing - Dessert Reception
草榴社区 Booth #208
Visit our 草榴社区 Booth to view the latest innovative technologies and chat with 草榴社区 experts live during the exhibition on February 25-26!
Please visit our conference presentations and course page to learn more about .
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