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Join us for an in-person 草榴社区 Technical Forum, taking place during 2025 SPIE Advanced Lithography + Patterning. Attendees will learn about the latest industry trends along with 草榴社区 Manufacturing's mask synthesis, mask data prep, and lithography simulation solutions.
Why Attend?
草榴社区 provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. 草榴社区’ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.
Who Should Attend?
The 草榴社区 Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.
Agenda
12:00 - 12:20 PM
Registration & Lunch
12:20 - 12:30 PM
Welcome & Introduction
Kostas Adam, 草榴社区
12:30 - 1:00 PM
High NA EUV Pathfinding for Continued GAA Scaling and Next Generation Architecture Enablement
Dan Dechene, IBM
1:00 - 1:30 PM
High NA EUV: Stitching for Manufacturing
Kimberly Pierce, Intel
1:30 - 2:00 PM
Application of RealCurve OPC for Advanced Memory
Eric Christensen, Micron
2:00 - 2:30 PM
Enhancing OPC Accuracy in 28nm-class Analog Devices: Addressing Degradation in Specific BEOL Patterns Through Recipe Tuning and Simulation
Keeho Kim, Texas Instruments
2:30 - 3:00 PM
FUJIFILM Electronic Materials Activities for Next Generation Lithography
Naohiro Tango, Fujifilm
3:00 - 3:20 PM
Novel Generative-AI Applications to Physical Design Layout Analytics, Mask Data Synthesis and Lithography Process Simulation
Luigi Capodieci, 草榴社区
3:20 - 4:00 PM
Thank you & networking reception
草榴社区 at 2025 SPIE Advanced Lithography + Patterning
Presenter: Kostas Adam - Vice President of R&D Engineering, 草榴社区
Date & Time: February 25 | 11:10 – 11:50 AM
See the full list of 草榴社区 presented papers & technical sessions happening at SPIE.
草榴社区 Booth #208
Visit our booth on the exhibit floor to view the latest innovative technologies and chat with 草榴社区 experts live on February 25-26!
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