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For accurate modeling of topographical process steps

Sentaurus Topography is an advanced simulator for physical modeling of topography-modifying process steps such as deposition, etching, spin-on-glass, reflow and chemical-mechanical polishing. It supports complex process structures of multiple layers with different material properties, using advanced physical models and numeric algorithms. Sentaurus Topography is also ideal for predicting the topography of back-end processes by simulating the complex steps used to build the interconnect layers.

Process development engineers can use Sentaurus Topography to optimize existing processes and to develop new process flows. In manufacturing, Sentaurus Topography is a key tool to study the effects of misalignment and process variation to improve process capability and yield.

In addition, the interface between Sentaurus Topography and Sentaurus Process allows users to combine front-end thermal and topography simulations in one environment. Sentaurus Topography is fully integrated into Sentaurus Workbench, a state-of-the-art TCAD framework and visualization tool.